Future Trends in Microelectronics
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Future Trends in Microelectronics
The Nano Millennium
Luryi, Serge; Xu, Jimmy; Zaslavsky, Alex
John Wiley & Sons Inc
09/2002
408
Dura
Inglês
9780471212478
15 a 20 dias
758
Descrição não disponível.
Preface (S. Luryi, et al.).
PART I: THE FUTURE WITH SILICON.
Microelectronics Technology: Challenges in the 21st Century (S. Sze).
Trends in Microlithography (J. Benschop).
Strategies at the End of CMOS Scaling (P. Solomon).
Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).
Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).
Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).
Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).
Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).
Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).
PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.
FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).
Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).
Taming Tunneling (M. Kelly).
Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).
DNA Conduction Mechanisms and Engineering (R. Zia, et al.).
New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).
PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.
The Evolution of Optical Data Storage (H. van Houten).
Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).
Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).
Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).
Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).
The Future of Photovoltaics (M. Green).
Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).
Solid State Lighting (A. Zukauskas, et al.).
Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).
Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).
PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.
Quantum Computing: A View from the Enemy Camp (M. Dyakonov).
Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).
Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).
Photonics with Chips (A. Nurmikko).
Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).
InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).
List of Contributors.
Index.
PART I: THE FUTURE WITH SILICON.
Microelectronics Technology: Challenges in the 21st Century (S. Sze).
Trends in Microlithography (J. Benschop).
Strategies at the End of CMOS Scaling (P. Solomon).
Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).
Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).
Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).
Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).
Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).
Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).
PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.
FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).
Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).
Taming Tunneling (M. Kelly).
Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).
DNA Conduction Mechanisms and Engineering (R. Zia, et al.).
New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).
PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.
The Evolution of Optical Data Storage (H. van Houten).
Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).
Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).
Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).
Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).
The Future of Photovoltaics (M. Green).
Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).
Solid State Lighting (A. Zukauskas, et al.).
Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).
Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).
PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.
Quantum Computing: A View from the Enemy Camp (M. Dyakonov).
Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).
Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).
Photonics with Chips (A. Nurmikko).
Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).
InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).
List of Contributors.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
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Preface (S. Luryi, et al.).
PART I: THE FUTURE WITH SILICON.
Microelectronics Technology: Challenges in the 21st Century (S. Sze).
Trends in Microlithography (J. Benschop).
Strategies at the End of CMOS Scaling (P. Solomon).
Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).
Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).
Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).
Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).
Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).
Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).
PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.
FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).
Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).
Taming Tunneling (M. Kelly).
Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).
DNA Conduction Mechanisms and Engineering (R. Zia, et al.).
New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).
PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.
The Evolution of Optical Data Storage (H. van Houten).
Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).
Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).
Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).
Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).
The Future of Photovoltaics (M. Green).
Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).
Solid State Lighting (A. Zukauskas, et al.).
Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).
Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).
PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.
Quantum Computing: A View from the Enemy Camp (M. Dyakonov).
Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).
Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).
Photonics with Chips (A. Nurmikko).
Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).
InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).
List of Contributors.
Index.
PART I: THE FUTURE WITH SILICON.
Microelectronics Technology: Challenges in the 21st Century (S. Sze).
Trends in Microlithography (J. Benschop).
Strategies at the End of CMOS Scaling (P. Solomon).
Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).
Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).
Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).
Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).
Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).
Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).
PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.
FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).
Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).
Taming Tunneling (M. Kelly).
Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).
DNA Conduction Mechanisms and Engineering (R. Zia, et al.).
New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).
PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.
The Evolution of Optical Data Storage (H. van Houten).
Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).
Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).
Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).
Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).
The Future of Photovoltaics (M. Green).
Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).
Solid State Lighting (A. Zukauskas, et al.).
Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).
Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).
PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.
Quantum Computing: A View from the Enemy Camp (M. Dyakonov).
Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).
Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).
Photonics with Chips (A. Nurmikko).
Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).
InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).
List of Contributors.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
